Difference between LPCVD and PECVD
Difference between LPCVD and PECVD By operating at high temperatures in a low-pressure environment, L
Products
Finding suitable electron microscope carrier mesh support film
Transmission Electron Microscopy (TEM)
Silicon nitride films are strong, chemically resistant, carbon free, and flat, making them ideal for microscopy applications.
Transmission Electron Microscopy (TEM)
There is better imaging, better permeability to gases or liquids, pressure balancing, availability for gas diffusion separation, and reduced experimental contamination.
Synchrotron Radiation (X-Ray)
High transmittance, good strength and hardness, corrosion resistance, low scattering, easy fabrication and processing of silicon nitride films for X-ray fluoroscopy windows
Transmission Electron Microscopy (TEM)
High transmittance, low refractive index, high temperature resistance, and good chemical stability. Suitable for optical applications in the visible, ultraviolet and infrared wavelength ranges
Transmission Electron Microscopy (TEM)
Functional Chips
Developed a full range of chips for gas phase, liquid phase, thermal, optical, mechanical, microfluidic, electrical, cryogenic, etc.
Transmission Electron Microscopy (TEM)
Higher transparency, higher stability, smaller aperture and better mechanical properties for improved resolution and stability of the electron microscope
Applications
About the application area of the chip
Applications
Applications
Applications
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About Us
Our Advantages
Global Supply
Our products can be shipped all over the world
High Quality
Ultra-strong support, pressure tolerance (PSI): 60, pressure <250Mpa
Super flat
Surface roughness: <0.3nm, thickness consistency: <5 %
Ultra Clean
Film is clean and free of debris, prepared in a class 100 clean room
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