Properties of diamond films and their applications Diamond has a range of excellent properties, including the highest hardness of any known substance, modulus of elasticity wear resistance, extremely high

Principles and Characteristics of Thin Film Preparation by Sputtering Sputtering is a type of Physical Vapor Deposition (PVD), which can be used to prepare a wide range of thin films such as insulators, metals, etc.

Principles and Advantages of Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) PECVD is a technology that complements the CVD and PVD technologies.

Why Choose Electron Beam (EB-PVD) for Vacuum Evaporation What is Vacuum Evaporation Vacuum evaporation is a process in which a substance is changed from a solid or liquid state in a vacuum to a

Thin film nucleation and growth Thin film nucleation and growth is a central step in coating technology. The nucleation phase involves the formation of tiny nuclei of the deposited material on the surface of the substrate.

What are the factors that influence the sputter coating process on thin film materials? By bombarding the surface of a solid with energetic particles (usually positive ions accelerated by an electric field), the solid

Magnetron sputtering 丨 reasons affecting the quality of thin films Magnetron sputtering has the advantages of high speed, low temperature, low damage, especially easy to continuously produce large-area film layers, easy to