Difference between LPCVD and PECVD
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Perforated Silicon Nitride TEM Window Grids
Better aeration and liquid passage performance than ordinary silicon nitride thin film windows, better suited for applications requiring fluid transfer and aeration
Data Sheet
Silicon Nitride Thin Film Window Product Sheet
Product Details
Selling unit
10pcs/pack
Chip Size
Diameter 3 mm, 5 mm, 10 mm
Chip thickness
200 μm
Film thickness
15 nm, 20 nm, 30 nm, 50 nm, 100 nm, 200 nm
Window size
0.01 x 0.01, 0.05 x 0.05, 0.5 x 0.5, 1 x 1 mm
Number of windows
1pc
Aperture size
Micron pore, nanopore
Stress conditions
<250MPa
Advantages of silicon nitride films.
- Acid/alkaline resistant: Samples can be manipulated and studied under acid and alkaline conditions.
- High temperature resistance: film can withstand temperatures up to 1000°C
- Carbon free, easy to clean
- Big Vision
- Supports a wide range of microscopes: e.g. TEM, SEM, FIB, EDX, Auger, XPS and AFM/SPM
Our product advantages.
- Robust silicon nitride films in thicknesses of 10, 20, 30, 50, 100 and 200 nm
- Standard specification: fully compatible with standard 3.05 mm TEM holders
- Available in standard 200 µm and thinner 100 µm frame thicknesses
- Hydrophilic/hydrophobic silicon nitride films are available upon request
- Clean, extremely flat silicon nitride film
- Has high strength and flatness
- Low Stress
Perforated silicon nitride film windows have the following advantages over ordinary silicon nitride film windows without perforations:
Improved material transmittance: Perforated silicon nitride film windows have higher transmittance because the holes reduce the chance of light being absorbed by the film, thus increasing transmittance, which makes it more suitable for applications requiring high transmittance, such as optical analysis.
Improved sampling speed: The openings in the perforated silicon nitride film window promote sample aeration, reducing isolation between the sample and the environment, thereby reducing the time to acquire data. This gives it an advantage in applications where high aeration and acquisition speed are required.
Improving material stability: Perforated silicon nitride thin film windows can reduce the internal stress and thermal expansion coefficient of the material during the preparation process due to its reasonable structural design, thus improving the stability and reliability of the material.
Improved durability: The perforated silicon nitride film window is structurally designed to improve its resistance to corrosion and wear. This gives it an advantage in applications that require prolonged use.
Improved flux: The large open area of the perforated silicon nitride film window allows for improved flux. This gives it an advantage in applications where high flux is required.
In summary, silicon nitride thin film windows with holes perform better in terms of optical properties compared to ordinary silicon nitride thin film windows without holes. Therefore, in material characterization applications, silicon nitride thin film windows with holes are usually a better choice.
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