High quality silicon nitride window for TEM丨TEM Grids

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TEM Silicon nitride thin film window

High quality, high performance silicon nitride thin film windows made by the most advanced MEMS manufacturing process, with a film thickness of 10-200 nm

Data Sheet

Silicon Nitride Thin Film Window Product Sheet

Selling unit

10pcs/pack

Chip Size

φ 3 mm

Chip thickness

100 μm, 200 μm

Film thickness

10 nm, 20 nm, 30 nm, 50 nm, 75 nm, 100 nm

Window size

0.1 x 0.1, 0.25 x 0.25, 0.5 x 0.5, 0.75 x 0.75, 1 x 1, 1 x 0.25, 1.5 x 0.1, 1.5 x 0.2

Number of windows

1, 2, 9

Aperture size

No hole

Stress conditions

<250MPa

Advantages of silicon nitride films.

Acid/alkaline resistant: Samples can be manipulated and studied under acid and alkaline conditions.
High temperature resistance: film can withstand temperatures up to 1000°C
Carbon free, easy to clean
Big Vision
Supports a wide range of microscopes: e.g. TEM, SEM, FIB, EDX, Auger, XPS and AFM/SPM

Our product advantages.

Robust silicon nitride films in thicknesses of 10, 20, 30, 50, 100 and 200 nm
Standard specification: fully compatible with standard 3.05 mm TEM holders
Available in standard 200 µm and thinner 100 µm frame thicknesses
Hydrophilic/hydrophobic silicon nitride films are available upon request
Clean, extremely flat silicon nitride film
Has high strength and flatness
Low Stress

Our silicon nitride support films are manufactured using the most advanced semiconductor and MEMS manufacturing technologies. Amorphous silicon nitride support films are grown on silicon wafers to the desired film thickness of 10, 20, 30, 50, 100 or 200 nm.

The sample viewing area is created by etching away a window in the silicon substrate, leaving a perfectly smooth, flexible and chemically stable silicon nitride film. The frame is manufactured using a 3 mm silicon disk. It is ideally suited for standard TEM mounts. The standard thickness of the silicon frame is 100µm/200µm, which fits most TEM mounts.