Difference between LPCVD and PECVD
Difference between LPCVD and PECVD By operating at high temperatures in a low-pressure environment, L
Synchrotron (X-Ray) silicon nitride thin film window
It is widely used in X-ray fluorescence analysis, electron energy spectrometer, X-ray diffraction and X-ray absorption, etc. Made by the most advanced MEMS manufacturing process.
Data Sheet
Silicon Nitride Thin Film Window Product Sheet
Product Details
Selling unit
10pcs/pack
Chip Size
5 x 5 mm, 7.5 x 7.5 mm, 10 x 10 mm
Chip thickness
200 μm
Film thickness
10 nm, 20 nm, 30 nm, 50 nm, 100 nm, 200 nm
Window size
0.1 x 0.1, 0.25 x 0.25, 0.5 x 0.5, 1 x 1, 1.5 x 1.5, 2 x 2, 3 x 3, 5 x 5 mm
Number of windows
1pc
Aperture size
No hole
Stress conditions
<250MPa
Advantages of silicon nitride films.
- Acid/alkaline resistant: Samples can be manipulated and studied under acid and alkaline conditions.
- High temperature resistance: film can withstand temperatures up to 1000°C
- Carbon free, easy to clean
- Big Vision
- Supports a wide range of microscopes: e.g. TEM, SEM, FIB, EDX, Auger, XPS and AFM/SPM
Our product advantages.
- Robust silicon nitride films in thicknesses of 10, 20, 30, 50, 100 and 200 nm
- Standard specification: fully compatible with standard 3.05 mm TEM holders
- Available in standard 200 µm and thinner 100 µm frame thicknesses
- Hydrophilic/hydrophobic silicon nitride films are available upon request
- Clean, extremely flat silicon nitride film
- Has high strength and flatness
- Low Stress
Our silicon nitride support films are manufactured using the most advanced semiconductor and MEMS manufacturing technologies. Amorphous silicon nitride support films are grown on silicon wafers to the desired film thickness of 10, 20, 30, 50, 100 or 200 nm.
The sample viewing area is created by etching away a window in the silicon substrate, leaving a perfectly smooth, flexible and chemically stable silicon nitride film. The frame is manufactured using a 3 mm silicon disk. It is ideally suited for standard TEM mounts. The standard thickness of the silicon frame is 100µm/200µm, which fits most TEM mounts.
Find Screening Specifications
Similar products you may be interested in
Similar Products
Can't find the chip you want?
We provide custom chip processing services according to your needs.
Latest News
A story about our capabilities, our research and the changing face of our company.
Process Principles and Applications of Optical Coatings
Principles and Applications of Optical Coating Technology The process principles of optical coating are mainly involved in the optical element
Influence of the annealing process on the platinum resistance
Influence of the annealing process on platinum resistors In the field of high-precision temperature measurement, thin-film-type platinum resistors are used because of
Magnetron sputtering丨process for making platinum temperature sensors
Magnetron sputtering丨the process of making platinum temperature sensors In modern technology, temperature sensors
