Difference between LPCVD and PECVD
Difference between LPCVD and PECVD By operating at high temperatures in a low-pressure environment, L
Nanoimprinted Stencils - Column Arrays
Can be applied to photonics device fabrication, nanofilters and surface-enhanced Raman spectroscopy, etc. for controlling light propagation and interactions to achieve modulation and enhancement of optical properties
Data Sheet
Nanoimprinting Stencil Product Sheet
Product Details
| Periodicity | Effective area | Maximum etching depth (silicon/quartz) | Column diameter | Model |
| 200nm | φ94 mm | 120nm/100nm | 90~120 nm | P200H_D100 |
| 350nm | φ50 mm | 350nm/150nm | 120~170 nm | P350H_D50 |
| 450nm | φ94 mm | 450nm/200nm | 220~260 nm | P450H_D100 |
| 600nm | φ94 mm | 450nm/200nm | 250~300 nm | P600H_D100 |
| 750nm | 51x51 mm² | 450nm/200nm | 250~350 nm | P750H_51x51 |
| 780nm | φ50 mm | 450nm/200nm | 250~350 nm | P780H_D50 |
| 870nm | φ94 mm | 550nm/250nm | 300~400 nm | P870H_D100 |
| 1000nm | φ94 mm | 600nm/300nm | 300~500 nm | P1000H_D100 |
| 1500nm | 51x51 mm² | 600nm/300nm | 400~650 nm | P1500H_51x51 |
| 1700nm | φ94 mm | 800nm/400nm | 500~800 nm | P1700H_D100 |
| 2000nm | φ94 mm | 800nm/400nm | 600~1100 nm | P2000H_D100 |
| 3000nm | φ94 mm | 1000nm/400nm | 600~1400 nm | P3000H_D100 |
| 3500nm | φ94 mm | 1200nm/500nm | 600~1600 nm | P3450H_D100 |
| 5200nm | φ94 mm | 1200nm/500nm | 600~2000 nm | P5200H_D100 |
| Periodicity | Effective area | Maximum etching depth (silicon) | Column diameter | Model |
| 200nm | 20x20 mm² | 90 nm | 110 nm | P200H_20x20 |
| 350nm | 20x20 mm² | 260 nm | 130 nm | P350H_20x20 |
| 400nm | 5x5 mm² | 100 nm | 140 nm | P400H_D100 |
| 600nm | 20x20 mm² | 310 nm | 300 nm | P600H_D100 |
| 750nm | 25x25 mm² | 260 nm | 325 nm | P750H_D100 |
| 1000nm | 20x20 mm² | 470 nm | 470 nm | P1000H_D100 |
| 1732nm | 20x20 mm² | 590 nm | 880 nm | P1732H_D100 |
| 3000nm | 20x20 mm² | 5000 nm | 1400 nm | P3000H_D100 |
| 3000nm | 20x20 mm² | 1200 nm | 1800 nm | P3000H_D100 |
| 250nm | 14x14 mm² | 150 nm | 136 nm (conical) | P250H_D100 |
| Periodicity | Effective area | Maximum etching depth (silicon/quartz) | Column diameter | Model |
| 125nm | φ90mm | 90nm/60nm | 50~70nm | P125S_D90 |
| 140nm | φ80mm | 75nm/ - | 50~75nm | P140S_D80 |
| 150nm | φ90mm | 75nm/ - | 60~85nm | P150S_D90 |
| 250nm | φ94mm | 200nm/100nm | 110~130nm | P250S_D90 |
| 280nm | Φ80mm | 200nm/100nm | 120~150nm | P280S_D80 |
| 300nm | φ94mm | 200nm/100nm | 120~160nm | P300S_D100 |
| 380nm | φ94mm | 400nm/300nm | 160~220nm | P380S_D100 |
| 400nm | φ94mm | 300nm/100nm | 150~220nm | P400S_D100 |
| 480nm | φ94mm | 500nm/400nm | 200~270nm | P480S_D100 |
| 500nm | φ94mm | 400nm/150nm | 200~250nm | P500S_D100 |
| 560nm | Φ80mm | 400nm/150nm | 200~280nm | P560S_D80 |
| 600nm | φ94mm | 500nm/250nm | 200~300nm | P600S_D100 |
| 760nm | φ94mm | 700nm/600nm | 330~430nm | P760S_D100 |
| 800nm | φ94mm | 500nm/300nm | 200~400nm | P800S_D100 |
| Periodicity | Effective area | Maximum etching depth (silicon) | Column diameter | Model |
| 125nm | 10x10 mm² | 95 nm | 54 nm | P125S_10x10 |
| 125nm | 20x20 mm² | 95 nm | 74 nm | P125S_20x20 |
| 150nm | 20x20 mm² | 135 nm | 62 nm | P150S_20x20 |
| 150nm | 5x5 mm² | 110 nm | 80 nm | P150S_5x5 |
| 250nm | 20x20 mm² | 200 nm | 115 nm | P250S_20x20 |
| 300nm | 14x14 mm² | 170 nm | 145 nm | P300S_D100 |
| 550nm | 20x20 mm² | 150nm/300nm | 300 nm | P380S_D100 |
| 800nm | 20x20 mm² | 250 nm | 440 nm | P400S_D100 |
Features and Benefits:
High resolution: Our nanoimprint stencil has excellent resolution capabilities, allowing for complex patterning at the nanoscale. This high-resolution property makes it ideal for studying nanoscale phenomena and fabricating nanodevices.
High precision: Our stencil manufacturing process uses advanced nanofabrication technology to ensure a high degree of consistency and precision. This high precision ensures that each stencil provides reliable and repeatable pattern transfer results.
Versatility: Our nanoimprint stencil can be used for a variety of applications. It can be used to fabricate nanoelectronic devices, such as nanotransistors and nanowires. It can also be used for the fabrication of optoelectronic devices, such as nano gratings and photonic crystals. In addition, it has a wide range of applications in the biomedical field, such as the fabrication of biochips and nanosensors.
Efficient: Our nanoimprint stencil manufacturing process is efficient and scalable. It can be mass-produced for large-scale manufacturing needs. This high efficiency makes our products the first choice for industrial and academic research.
Customization: We can provide customized nano-embossing stencils according to the needs of our customers. Whether it's a specific pattern design or a special material requirement, our team can tailor the best solution for you.
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