Difference between LPCVD and PECVD
Difference between LPCVD and PECVD By operating at high temperatures in a low-pressure environment, L
Nano-embossed stencil - Hole Array
4-inch nanoimprinted templates for applications such as nanofilters and nanosensors to control the transport, separation and detection of substances for highly sensitive analysis and detection capabilities
Data Sheet
Nanoimprinting Stencil Product Sheet
Product Details
| Periodicity | Effective area | Maximum etching depth (silicon/quartz) | Hole Diameter | Model |
| 200nm | φ 94 mm | 120nm/100nm | 90-120 nm | H200H_D100 |
| 350nm | φ 94 mm | 200nm/100nm | 120-170 nm | H350H_D100 |
| 450nm | φ 50 mm | 350nm/150nm | 220-260 nm | H450H_D50 |
| 500nm | φ 94 mm | 500nm/300nm | 250-300 nm | H500H_D100 |
| 600nm | φ 94 mm | 450nm/200nm | 250-300 nm | H600H_D100 |
| 750nm | 51x51 mm² | 450nm/200nm | 250-350 nm | H750H_51x51 |
| 780nm | φ 50 mm | 450nm/200nm | 250-380 nm | H780H_D50 |
| 870nm | φ 94 mm | 550nm/250nm | 300-45 nm | H870H_D100 |
| 1000nm | φ 94 mm | 600nm/300nm | 300~500 nm | H1000H_D100 |
| 1500nm | 51x51 mm² | 600nm/300nm | 400~650 nm | H1500H_51x51 |
| 1700nm | φ 94 mm | 800nm/400nm | 500~800 nm | H1700H_D100 |
| 2000nm | φ 94 mm | 800nm/400nm | 600~1100 nm | H2000H_D100 |
| 3000nm | φ 94 mm | 1000nm/400nm | 600~1400 nm | H3000H_D100 |
| 3500nm | φ 94 mm | 1200nm/500nm | 800~1600 nm | H3500H_D100 |
| 5200nm | φ 94 mm | 1200nm/500nm | 1200~2400 nm | H5200H_D100 |
| Periodicity | Effective area | Maximum etching depth (silicon) | Hole Diameter | Model |
| 200nm | 20x20 mm² | 200 nm | 100 nm | H200H_20x20 |
| 345nm | 20x20 mm² | 200 nm | 227 nm | H345H_20x20 |
| 500nm | 0.2x0.2 mm² (9x) | 110 nm | 50 nm | H500H_02x02 |
| 600nm | 20x20 mm² | 300 nm | 300 nm | H600H_25x25 |
| 750nm | 25x25 mm² | 420 nm | 380 nm | H750H_25x25 |
| 1000nm | 0.2x0.2 mm² (9x) | 110 nm | 100 nm | H1000H_02x02 |
| 1010nm | 15x15 mm² | 300 nm | 390 nm | H1010H_15x15 |
| 1010nm | 25x25 mm² | 300 nm | 490 nm | H1010H_25x25 |
| 1010nm | 25x25 mm² | 350 nm | 470 nm | H1010H_25x25 |
| 2000nm | 0.2x0.2 mm² (9x) | 110 nm | 200 nm | H2000H_02x02 |
| 3000nm | 20x20 mm² | 850 nm | 1500 nm | H3000H_20x20 |
| 3000nm | 20x20 mm² | 1500 nm | 1200 nm | H3000H_20x20 |
| Periodicity | Effective area | Maximum etching depth (silicon/quartz) | Hole Diameter | Model |
| 125nm | φ 90mm | 150nm/100nm | 50~70 nm | H125S_D90 |
| 125nm | 20x20 mm² | 90nm/- | 65 nm | H125S_20x20 |
| 140nm | Φ 80mm | 150nm/100nm | 60~80 nm | H140S_D80 |
| 150nm | φ 90mm | 150nm/100nm | 60~90 nm | H150S_D90 |
| 150nm | 5x5 mm² | 100nm/- | 65 nm | H150S_5x5 |
| 190nm | φ 94mm | 180nm/140nm | 85~115 nm | H190S_D100 |
| 200nm | φ 90mm | 200nm/150nm | 70~120 nm | H200S_D90 |
| 200nm | 5x5 mm² | 110nm/- | 70 nm | H200S_5x5 |
| 235nm | φ 94mm | 200nm/150nm | 100~135 nm | H235S_D100 |
| 250nm | 5x5 mm² | 110nm/- | 70 nm | H250S_5x5 |
| 300nm | φ 90mm | 200nm/150nm | 120~180 nm | H300S_D90 |
| 350nm | φ 94mm | 300nm/150nm | 240~280 nm | H350S_D100 |
| 350nm | 20x20 mm² | 300nm/- | 250 nm | H350S_20x20 |
| 375nm | φ 94mm | 200nm/100nm | 150~250 nm | H375S_D100 |
Features and Benefits:
High resolution: Our nanoimprint stencil has excellent resolution capabilities, allowing for complex patterning at the nanoscale. This high-resolution property makes it ideal for studying nanoscale phenomena and fabricating nanodevices.
High precision: Our stencil manufacturing process uses advanced nanofabrication technology to ensure a high degree of consistency and precision. This high precision ensures that each stencil provides reliable and repeatable pattern transfer results.
Versatility: Our nanoimprint stencil can be used for a variety of applications. It can be used to fabricate nanoelectronic devices, such as nanotransistors and nanowires. It can also be used for the fabrication of optoelectronic devices, such as nano gratings and photonic crystals. In addition, it has a wide range of applications in the biomedical field, such as the fabrication of biochips and nanosensors.
Efficient: Our nanoimprint stencil manufacturing process is efficient and scalable. It can be mass-produced for large-scale manufacturing needs. This high efficiency makes our products the first choice for industrial and academic research.
Customization: We can provide customized nano-embossing stencils according to the needs of our customers. Whether it's a specific pattern design or a special material requirement, our team can tailor the best solution for you.
Hexagonal hole arrays and rectangular hole arrays in nanoimprinted templates are two common patterns of hole-like structures used to achieve precise nanoscale pattern transfer and preparation.
These two types of hole array templates are highly preparative consistent and reproducible during nanoimprinting and can meet the needs of precision nanostructure preparation. They provide important tools and solutions for areas such as nanofabrication, nanodevice research, and biomedical applications.
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